Polishing pad

Polishing pad

  • CN 101,489,721 A
  • Filed: 08/16/2007
  • Published: 07/22/2009
  • Est. Priority Date: 08/28/2006
  • Status: Active Application
First Claim
Patent Images

1. polishing pad, it has the polishing layer that is made of the polyurethane foaming body with micro-bubble, it is characterized in that, described polyurethane foaming body contains the reaction solidfied material of isocyanate-terminated prepolymer (A), poly vulcabond and cahin extension agent, wherein, described isocyanate-terminated prepolymer (A) contains isocyanate-monomer, high molecular weight polyols (a) and low molecular weight polyols.

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