Cyclic cvd or ALD is utilized to prepare metal oxide film

Cyclic cvd or ALD is utilized to prepare metal oxide film

  • CN 101,555,591 B
  • Filed: 04/10/2009
  • Issued: 08/19/2015
  • Est. Priority Date: 04/11/2008
  • Status: Active Grant
First Claim
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1. form a cyclic deposition method for ternary metal oxide film, wherein, successively multiple presoma is introduced sediment chamber, make it to evaporate and be deposited in substrate under the condition forming described ternary metal oxide film, its improvements comprise:

  • Utilize the first metal ketoiminate as the first presoma;

    Utilize containing oxygen source;

    Utilize the second metal ketoiminate as being different from the former the second presoma;

    WithUtilize containing oxygen source,Wherein a kind of metal ketoiminate is selected from the group representated by following structure A;

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