Mechanical enhancement of dense and porous organosilicate materials by uv exposure

Mechanical enhancement of dense and porous organosilicate materials by uv exposure

  • CN 101,621,001 A
  • Filed: 03/04/2004
  • Published: 01/06/2010
  • Est. Priority Date: 03/04/2003
  • Status: Active Grant
First Claim
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1. method of improving the material hardness and the modulus of elasticity of organosilicate film comprises:

  • By chemical vapour deposition (CVD), use at least a chemical reagent of making skeleton agent precursor that comprises at least a portion substrate, to deposit organic silicate thin film, to obtain having the organosilicate film of first material hardness and first modulus of elasticity;

    WithIn the non-oxidizing gas environment, the organosilicate film is exposed in the UV source, to obtain having the organosilicate film of second material hardness and second modulus of elasticity, wherein second material hardness and second modulus of elasticity are higher by 10% than first material hardness and first modulus of elasticity at least.

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