Pecvd process chamber backing plate reinforcement

Pecvd process chamber backing plate reinforcement

  • CN 101,622,375 B
  • Filed: 02/27/2008
  • Issued: 10/21/2015
  • Est. Priority Date: 02/27/2007
  • Status: Active Grant
First Claim
Patent Images

1. a plasma enhanced chemical vapor deposition equipment, comprising:

  • Chamber body;

    Backboard, couples with described chamber body, and around treatment zone;

    AndSkeleton construction, is arranged at outside described treatment zone, and couples with the middle section of described backboard;

    Wherein said skeleton construction also comprises;

    Bridging part, described bridging part is across described backboard and have middle section;

    Multiple leg, extends from the edge section of described bridging part;

    AndSupport component, screw lock is coupled between the described middle section of described bridging part and the described middle section of described backboard, wherein said support component couples with the described middle section screw lock of described backboard by least one first fastening piece, and described support component couples with the described middle section screw lock of described bridging part by least one second fastening piece, at least one second fastening piece wherein said has screw thread at first end or at the second end or at first end and the second end two ends, at least one second fastening piece wherein said extends through the described middle section of described bridging part and couples with the described middle section of described bridging part adjustably, the shape of described backboard is controlled with the Distance geometry adjusted between described support component and described bridging part.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×