Shadow mask and fabrication method thereof

Shadow mask and fabrication method thereof

  • CN 101,764,198 A
  • Filed: 01/12/2010
  • Published: 06/30/2010
  • Est. Priority Date: 01/12/2010
  • Status: Active Application
First Claim
Patent Images

1. a shadow mask is characterized in that, comprising:

  • One framework, this framework defines a central open area substantially;

    At least one supporting construction is arranged at this central open area substantially, and wherein this supporting construction is linked to this framework in movable mode;

    AndAt least one shielding is arranged in this central open area substantially, and supports by this supporting construction.

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