Mask plate and manufacturing method thereof

Mask plate and manufacturing method thereof

  • CN 101,770,091 A
  • Filed: 12/31/2008
  • Published: 07/07/2010
  • Est. Priority Date: 12/31/2008
  • Status: Active Application
First Claim
Patent Images

1. a mask is characterized in that, comprising:

  • Upper substrate;

    The first electrically conducting transparent winding displacement is positioned at described upper substrate and arranges towards first direction;

    First transparent insulating film is positioned at described first electrically conducting transparent winding displacement top and covers described upper substrate;

    Infrabasal plate;

    The second electrically conducting transparent winding displacement is positioned at described infrabasal plate and towards the second direction arrangement, described second direction is perpendicular to described first direction;

    Second transparent insulating film is positioned at described second electrically conducting transparent winding displacement top and covers described infrabasal plate;

    Accompany liquid crystal between described upper substrate and the described infrabasal plate.

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