Isolation structure and formation method thereof

Isolation structure and formation method thereof

  • CN 101,894,788 A
  • Filed: 05/18/2010
  • Published: 11/24/2010
  • Est. Priority Date: 05/22/2009
  • Status: Active Application
First Claim
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1. insulation system is characterized in that it comprises:

  • One groove, be arranged in a substrate, wherein a sidewall of this groove has one first inclined-plane and one second inclined-plane, and this first inclined-plane is positioned on this second inclined-plane, the slope on this first inclined-plane is different from the slope on this second inclined-plane, and the length on this first inclined-plane is greater than 15 nanometers.

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