The electrode that plasma processing apparatus and plasma processing apparatus are used

The electrode that plasma processing apparatus and plasma processing apparatus are used

  • CN 101,896,033 A
  • Filed: 03/05/2010
  • Published: 11/24/2010
  • Est. Priority Date: 03/06/2009
  • Status: Active Grant
First Claim
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1. plasma processing apparatus comprises:

  • Container handling, it carries out plasma treatment in inside to handled object;

    First electrode and second electrode, its inside at described container handling is relative mutually, and forms the processing space between them;

    WithHigh frequency electric source, it is connected with in described second electrode at least one with described first electrode, exports High frequency power in described container handling,This plasma processing unit is characterised in that;

    In described first electrode and described second electrode at least one comprises;

    The base material that forms by tabular dielectric;

    WithFirst resistive element of the metal that between described base material and plasma, is provided with.

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