A kind of chemical mechanical polishing liquid

A kind of chemical mechanical polishing liquid

  • CN 101,955,732 B
  • Filed: 07/13/2009
  • Issued: 06/15/2016
  • Est. Priority Date: 07/13/2009
  • Status: Active Grant
First Claim
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1. the chemical mechanical polishing liquid application in improving TEOS removal rate, described chemical mechanical polishing liquid comprises:

  • abrasive grains, ortho phosphorous acid or its salt, surfactant, wherein said ortho phosphorous acid or its salt are selected from one or more in slaine, ammonium salt and quaternary ammonium salt.

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