Plasma processing apparatus and method

Plasma processing apparatus and method

  • CN 101,999,158 A
  • Filed: 04/09/2009
  • Published: 03/30/2011
  • Est. Priority Date: 04/12/2008
  • Status: Active Application
First Claim
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1. apparatus for processing plasma, it comprises at least:

  • Treatment chamber has gas distribution showerhead and essentially rectangular backboard;

    One or more power source is coupled to this backboard in one or more primary importance;

    AndOne or more source of the gas, be coupled to this backboard three other positions, separate with this one or more primary importance separately these three other positions, and wherein one of these three positions place the second place, between two parallel sides of this second place and this backboard the essence equidistance are arranged.

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