Method and device for vaporizing hydrogen chloride in tail gas in polycrystalline silicon production

Method and device for vaporizing hydrogen chloride in tail gas in polycrystalline silicon production

  • CN 102,039,082 B
  • Filed: 06/09/2010
  • Issued: 08/31/2011
  • Est. Priority Date: 06/09/2010
  • Status: Active Grant
First Claim
Patent Images

1. the method for vaporization hydrogen chloride in tail gas in the production of polysilicon, it is characterized in that:

  • from the isolated low temperature chlorination hydrogen of hydrogen chloride knockout tower cat head liquid, pass through heat transmission equipment, with separate Tata from hydrogen chloride at the bottom of isolated high-temperature chlorine silane liquid carry out heat exchange, thereby making low temperature chlorination hydrogen liquid absorb heat is vaporized fully, realize separating with the small amounts of chlorine silane liquid of wherein carrying secretly, high-temperature chlorine silane fluid temperature reduces, and enters the absorption tower as low temperature absorption liquid and continues to absorb hydrogen chloride in the tail gas.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×