Substrate liquid processing apparatus and substrate liquid processing method

Substrate liquid processing apparatus and substrate liquid processing method

  • CN 102,044,412 A
  • Filed: 10/15/2010
  • Published: 05/04/2011
  • Est. Priority Date: 10/16/2009
  • Status: Active Grant
First Claim
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1. a substrate liquid handling device is used for substrate is implemented liquid handling, it is characterized in that having:

  • The substrate holding unit, it keeps substrate;

    First treatment fluid ejection unit, its circuit to the substrate that is kept by the substrate holding unit form face ejection treatment fluid;

    Second treatment fluid ejection unit, its circuit to the substrate that is kept by the substrate holding unit form the opposing face ejection treatment fluid of face;

    AndControl unit, it is to the aforesaid substrate holding unit and above-mentioned first treatment fluid sprays the unit and above-mentioned second treatment fluid ejection unit is controlled,Wherein, above-mentioned control unit is controlled the feasible following operation of carrying out;

    The liquid handling operation, the processing substrate soup that is used for substrate is carried out liquid handling to the circuit formation face ejection of substrate from above-mentioned first treatment fluid ejection unit utilizes the processing substrate soup that the circuit formation face of substrate is handled as treatment fluid;

    AndRemove the electric treatment operation, before the aforesaid liquid treatment process, what the electric charge that the opposing face ejection that forms face to the circuit of substrate from above-mentioned second treatment fluid ejection unit is used to substrate is had discharged removes electric treatment liquid as treatment fluid, utilizes to remove electric treatment liquid substrate is handled.

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