Exposure menu creation method

Exposure menu creation method

  • CN 102,074,452 B
  • Filed: 11/24/2009
  • Issued: 08/10/2016
  • Est. Priority Date: 11/24/2009
  • Status: Active Grant
First Claim
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1. an exposure menu creation method, it is characterised in that when setting up exposure menu, make the notch of waferDirection is vertical with photomask board long side direction, and described notch is positioned on the perpendicular bisector on the long limit of described photomask board,Described wafer is 200mm, and the chip of described exposure menu is put as (2n+1) * (2n+2), n >

  • =1.

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