Chemical mechanical polishing liquid

Chemical mechanical polishing liquid

  • CN 102,093,816 A
  • Filed: 12/11/2009
  • Published: 06/15/2011
  • Est. Priority Date: 12/11/2009
  • Status: Active Application
First Claim
Patent Images

1. a chemical mechanical polishing liquid contains water, abrasive, oxygenant and water-soluble cationic tensio-active agent.

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