Polishing composition and utilize the finishing method of this polishing composition

Polishing composition and utilize the finishing method of this polishing composition

  • CN 102,105,267 B
  • Filed: 06/15/2009
  • Issued: 08/03/2016
  • Est. Priority Date: 06/18/2008
  • Status: Active Grant
First Claim
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1. polishing composition is in the purposes polished in polished object, it is characterised in that described polishing composition comprise abrasive particle withAnd acid, described acid is selected from hydroxyethylsulfonic acid., sulphur propanoic acid, sulphur propylene glycol, benzenesulfonic acid and ethionic acid, andWherein, described polished object is glass substrate or the synthetic quartz substrate of photomask of hard disk.

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