Cobalt deposition on barrier surfaces

Cobalt deposition on barrier surfaces

  • CN 102,132,383 A
  • Filed: 08/19/2009
  • Published: 07/20/2011
  • Est. Priority Date: 08/29/2008
  • Status: Active Application
First Claim
Patent Images

1. method that is used for deposition materials at a substrate surface, it comprises following steps:

  • On a base material, form a barrier layer;

    Expose this base material to two cobalt six carbonyl butyl-acetylene (CCTBA) and hydrogen (H to the open air 2) with on this barrier layer, forming a cobalt layer during the gas-phase deposition;

    And Deposit an electric conducting material on this cobalt layer.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×