Method and device for processing exhaust gas

Method and device for processing exhaust gas

  • CN 102,143,794 B
  • Filed: 08/21/2009
  • Issued: 04/29/2015
  • Est. Priority Date: 09/08/2008
  • Status: Active Grant
First Claim
Patent Images

1. a waste gas processing method waste gas from semiconductor-fabricating device is imported to combustion-type to remove the evil device, then will containing SiO 2dust collect plant is delivered to the waste gas of HF, and then by containing HF and the SiF that generates in dust collect plant 4waste gas send into the processing method of gas washing cleaning device of two-stage structure, The gas washing cleaning device of described two-stage structure is made up of first paragraph gas washing cleaning device and second segment gas washing cleaning device, in first paragraph gas washing cleaning device, carries out gas and cleans, be hydrolyzed SiF thus using water as detergent remover 4and make hydrolysate SiO 2to be dissolved into containing hydrofluoric acid and pH removes in the highly acid detergent remover of less than 1, then, in second segment gas washing cleaning device, to carry out gas using alkaline aqueous solution as detergent remover and clean, remove HF thus.

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