Interlayer insulating film and wiring structure, and process for producing the same

Interlayer insulating film and wiring structure, and process for producing the same

  • CN 102,148,217 A
  • Filed: 06/20/2006
  • Published: 08/10/2011
  • Est. Priority Date: 06/20/2005
  • Status: Active Application
First Claim
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1. electronic installation, it has Miltilayer wiring structure, it is characterized in that, as the interlayer dielectric of described Miltilayer wiring structure, possesses at least on the basalis of being formed on, and the surface is by the fluorocarbon film of nitrogenize.

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