Method for reducing surface light reflectivity of silicon chip

Method for reducing surface light reflectivity of silicon chip

  • CN 102,157,608 A
  • Filed: 01/12/2011
  • Published: 08/17/2011
  • Est. Priority Date: 12/30/2010
  • Status: Active Application
First Claim
Patent Images

1. a method that reduces the silicon chip surface light reflectivity is characterized in that, comprises the steps:

  • Step 1;

    silicon chip immersed in hydrofluoric acid and the mixed solution of salt that contains Ag ion, Cu ion, Ni ion or Mg ion carry out etching;

    AndStep 2;

    the silicon chip after the etching is put into nitric acid or chloroazotic acid clean to remove the metal covering on surface.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×