Trench manufacturing method

Trench manufacturing method

  • CN 102,201,371 A
  • Filed: 03/26/2010
  • Published: 09/28/2011
  • Est. Priority Date: 03/26/2010
  • Status: Active Application
First Claim
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1. the manufacture method of a groove, this method comprises:

  • In the silicon substrate deposited silicon nitride layer of mixing, deposited oxide layer adopts photoetching process and the etching technics silicon substrate of etching oxide layer, silicon nitride layer and doping successively again, forms raceway groove the first half;

    At raceway groove the first half and oxide layer surface deposition non-metallic suicides layer;

    Oxide skin(coating) with patterning is a mask, etches away the non-metallic suicides layer of raceway groove the first half bottom, continues the silicon substrate that etching is mixed, and obtains raceway groove, forms the non-metallic suicides layer sidewall of raceway groove the first half;

    Non-metallic suicides layer sidewall with raceway groove the first half is mask, adopts the wet etching raceway groove, and the Lower Half of widening raceway groove forms groove;

    Remove the non-metallic suicides layer.

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