Photoresist comprising nitrogen-containing compound

Photoresist comprising nitrogen-containing compound

  • CN 102,207,678 A
  • Filed: 01/25/2011
  • Published: 10/05/2011
  • Est. Priority Date: 01/25/2010
  • Status: Active Application
First Claim
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1. photo-corrosion-resisting agent composition, described composition comprises:

  • (a) one or more resins;

    (b) one or more light acid producing agent compounds;

    With(c) one or more nitrogen-containing compounds, described nitrogen-containing compound each self-contained

         1) two or more hydroxyl substituents and

         2) one or more smooth acid-unstable groups.

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