Photoresist comprising nitrogen-containing compound

Photoresist comprising nitrogen-containing compound

  • CN 102,207,678 B
  • Filed: 01/25/2011
  • Issued: 05/20/2015
  • Est. Priority Date: 01/25/2010
  • Status: Active Grant
First Claim
Patent Images

1. a photo-corrosion-resisting agent composition, described composition comprises:

  • (a) one or more resins;

    (b) one or more light acid producing agent compounds;

    WithNitrogen-containing compound shown in (c) one or more following formulas (IIC);

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×