Comprise the chemical-mechanical polishing compositions of tensio-active agent

Comprise the chemical-mechanical polishing compositions of tensio-active agent

  • CN 102,337,080 B
  • Filed: 10/21/2005
  • Issued: 01/20/2016
  • Est. Priority Date: 10/28/2004
  • Status: Active Grant
First Claim
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1. nonionogenic tenside is for strengthening the purposes removing speed of metallic surface in polishing composition, and described polishing composition comprises:

  • The Fumed alumina of (a) 0.2 to 1 % by weight,The Alpha-alumina of (b) 0.1 to 1 % by weight,The silicon-dioxide of (c) 0.1 to 4 % by weight, wherein said silicon-dioxide is colloid silica,The nonionogenic tenside of (d) 10 to 1000ppm, wherein this nonionogenic tenside is selected from the copolymer surfactants comprising siloxane unit, ethylene oxide unit and propylene oxide unit,(e) metal chelating organic acid,(f) oxygenant, it is selected from hydrogen peroxide, perhydrit, persulfuric acid, Peracetic Acid, peroxyboric acid, their salt and their combination, and(g) liquid vehicle.

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