Trichlorosilane synthesis process and equipment

Trichlorosilane synthesis process and equipment

  • CN 102,390,836 A
  • Filed: 08/23/2011
  • Published: 03/28/2012
  • Est. Priority Date: 08/23/2011
  • Status: Active Application
First Claim
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1. trichlorosilane synthesis device comprises:

  • Hydrogenchloride storage tank (1) is used to store hydrogen chloride gas;

    The synthetic furnace (2) that is used for the trichlorosilane building-up reactions;

    Said synthetic furnace is connected with said hydrogenchloride storage tank and receives hydrogen chloride gas from it;

    In said synthetic furnace, also add silica flour, silica flour and hydrogen chloride gas precursor reactant generate the mixture of trichlorosilane, dichloro-dihydro silicon and silicon tetrachloride;

    The condensing surface (3) that is connected with said synthetic furnace, said condensing surface is from the said mixture of synthetic furnace reception reaction generation and with said mixture condensation;

    First rectifying tower (5), the inlet of said first rectifying tower links to each other with condensing surface, and said first rectifying tower receives the mixture that is condensed, and is used for isolating dichloro-dihydro silicon from the mixture that is condensed;

    Second rectifying tower (6), the inlet of said second rectifying tower links to each other with at the bottom of the first rectifying Tata, and said second rectifying tower receives still liquid at the bottom of the first rectifying Tata, is used for from wherein isolating silicon tetrachloride;

    The vaporizer that links to each other with synthetic furnace (8);

    Said vaporizer receives through first rectifying tower and separates the liquid dichloro-dihydro silicon that obtains and separates the liquid silicon tetrachloride that obtains through second rectifying tower, and returns synthetic furnace after liquid dichloro-dihydro silicon and silicon tetrachloride vaporized.

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