Mark structure used for measuring distortion of projection object lens and its method

Mark structure used for measuring distortion of projection object lens and its method

  • CN 102,466,977 A
  • Filed: 11/11/2010
  • Published: 05/23/2012
  • Est. Priority Date: 11/11/2010
  • Status: Active Grant
First Claim
Patent Images

1. one kind is used to measure the mark structure that projection objective distorts, and this mark structure is formed on the mask, and definition has first direction and the second direction vertical with this first direction on this mask, and this mark structure comprises:

  • First graphics field, the center position of said first graphics field is provided with an independent marking;

    AndAt least one second graph zone, said second graph zone is made up of arrays of indicia, and arrange along this second direction in said first graphics field and second graph zone.

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