Underlayer composition and method of imaging underlayer composition

Underlayer composition and method of imaging underlayer composition

  • CN 102,540,704 A
  • Filed: 09/30/2011
  • Published: 07/04/2012
  • Est. Priority Date: 10/04/2010
  • Status: Active Application
First Claim
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1. one kind forms method of patterning, comprising:

  • Part through the irradiation photosensitive layer;

    Make the acid that in the photosensitive layer that comprises the light acid producing agent, produces diffuse in the neighbouring part of bottom, this bottom comprises and contains the acid-sensitive multipolymer that acid can be decomposed group, linking group and functional group that this linking group is covalently bound to the water-wetted surface of base material;

    Be cross-linked to form crosslinking copolymers;

    Perhaps both be covalently bound to the said surface of base material, be cross-linked to form crosslinking copolymers againWherein this photosensitive layer is configured on the surface of bottom, and diffusion comprises this bottom of heating and photosensitive layer, and the acid-sensitive group of the acid-sensitive multipolymer in the bottom and the acid reaction that is spread form the polarity zone on the surface of bottom, and this polarity zone has the shape of pattern;

    Remove photosensitive layer;

    On the surface of this bottom, form the self assembly layer;

    This self assembly layer comprises segmented copolymer;

    This block polymer comprises second block that this polarity zone is had first block of compatibility and this polarity zone had the compatibility littler than first block;

    Wherein this first block forms first microcell in this polarity zone of alignment, and this second block formed contiguous this first microcell alignment second microcell andRemove this first or second microcell to expose the underclad portion of this bottom.

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