The method of foundation composition and imaging foundation composition

The method of foundation composition and imaging foundation composition

  • CN 102,566,261 B
  • Filed: 09/30/2011
  • Issued: 09/22/2017
  • Est. Priority Date: 10/04/2010
  • Status: Active Grant
First Claim
Patent Images

1. a kind of method for forming pattern, including:

  • Irradiation includes a part for the bottom of acid-sensitive copolymer and light acid producing agent, and the acid-sensitive copolymer includes sour decomposable asymmetric choice net baseGroup, linking group and functional group, the linking group are covalently bound to the hydrophilic surface of base material, are cross-linked to form copolymer friendshipConnection, or the surface of base material had both been covalently bound to, crosslinking copolymers are cross-linked to form again, wherein the functional group can adjustThe neutrality of acid-sensitive copolymer,Wherein the sour decomposable asymmetric choice net group reacts with the acid produced by the light acid producing agent in the illuminated part as bottom, withPolar region is formed on the surface of bottom, the polar region has figuratum shape and size,Form Iy self-assembled layer on the surface of the bottom, the Iy self-assembled layer include block copolymer, the block copolymer have pairThe polar region has the first block of compatibility and embedding to the polar region second with the compatibility smaller than the first blockSection, wherein first block form the first microcell of the polar region that aligns, and second block form it is neighbouring thisSecond microcell of one microcell alignment, andFirst microcell or the second microcell is removed to expose the underclad portion of the bottom.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×