Temperature control of a substrate during a plasma ion implantation process for patterned disc media applications
Temperature control of a substrate during a plasma ion implantation process for patterned disc media applications
- CN 102,576,548 A
- Filed: 10/20/2010
- Published: 07/11/2012
- Est. Priority Date: 11/03/2009
- Status: Active Grant
- EN CH
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