Array substrate and manufacturing method thereof and display device

Array substrate and manufacturing method thereof and display device

  • CN 102,629,584 B
  • Filed: 11/15/2011
  • Issued: 03/25/2015
  • Est. Priority Date: 11/15/2011
  • Status: Active Grant
First Claim
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1. an array base palte, is characterized in that, described array base palte is ADS type array base palte, comprising:

  • The grid line set gradually from bottom to up on the substrate and gate electrode, gate insulation layer, semiconductor layer, doping semiconductor layer and pixel electrode, wherein grid line and gate electrode are arranged with layer;

    Be formed in data wire, source electrode and the drain electrode on the layer of described pixel electrode place, described source electrode and drain electrode are separated by channel region, and described doping semiconductor layer disconnects at channel region;

    Wherein, pixel electrode material is not retained below described source electrode;

    Be formed in the passivation layer on described source electrode, drain electrode and pixel electrode;

    Be formed in the public electrode on described passivation layer.

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