Functional nanoparticles

Functional nanoparticles

  • CN 102,648,438 A
  • Filed: 08/11/2010
  • Published: 08/22/2012
  • Est. Priority Date: 08/26/2009
  • Status: Active Application
First Claim
Patent Images

1. imprint lithography method comprises:

  • Form MULTILAYER SUBSTRATE, said MULTILAYER SUBSTRATE comprises;

    the removed layer of coupling and be coupled in the said sacrificial material layer of removing layer;

    Use the first imprint lithography template that said sacrifice layer is carried out Butut, the layer through Butut to be provided, the said pattern that has residual layer and a plurality of convexity and a plurality of grooves through the layer of Butut;

    The design transfer of said convexity and groove is removed in the layer to said;

    With functional material deposit to said remove the layer groove in;

    Said functional material is carried out Butut so that the functional material layer through Butut to be provided, and said functional material layer through Butut has a plurality of posts of removing in the layer said;

    AndSlough post from said MULTILAYER SUBSTRATE.

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