Phosphor-doped zinc stannate transparent conductive film, and preparation method and application thereof

Phosphor-doped zinc stannate transparent conductive film, and preparation method and application thereof

CN
  • CN 102,650,033 A
  • Filed: 02/24/2011
  • Published: 08/29/2012
  • Est. Priority Date: 02/24/2011
  • Status: Active Grant
First Claim
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1. the preparation method of a phosphorus doping zinc nesa coating comprises the steps:

  • Select ZnO, SnO for use 2And ZnHPO 4Be starting material, grind to form powder, make ZnO;

    SnO after high temperature sintering is handled 2;

    ZnHPO 4Ceramic target;

    With the above-mentioned ZnO that makes;

    SnO 2;

    ZnHPO 4Ceramic target and substrate are relatively packed in the vacuum cavity of magnetron sputtering film device at interval, and the vacuum tightness of said vacuum cavity is 1.0 * 10 -3Pa~

    1.0 * 10 -5Pa;

    Adjustment magnetron sputtering plating processing parameter is;

    sputtering power is 30~

    160W, operating pressure 0.2~

    1.5Pa, and the flow 15~

    25sccm of argon gas and hydrogen hybrid working gas;

    Carry out coating film treatment then, make said phosphorus doping zinc nesa coating.

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