Compositions comprising base-reactive component and processes for photolithography

Compositions comprising base-reactive component and processes for photolithography

  • CN 102,681,336 B
  • Filed: 12/30/2011
  • Issued: 04/12/2017
  • Est. Priority Date: 12/30/2010
  • Status: Active Grant
First Claim
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1. it is a kind of process photo-corrosion-resisting agent composition method, comprising:

  • A () applies a kind of photo-corrosion-resisting agent composition to form photoresist layer on base material, wherein the photoresistCompositionss are included:

    (i) one or more resin,(ii) photosensitive component, and(iii) one or more material comprising alkali-reactive group, described one or more comprising alkali-reactive groupMaterial is different from above-mentioned one or more resin;

    WithB () is dried the photoresist layer of the above-mentioned applying of exposure with radioactivation photo-corrosion-resisting agent composition,Wherein, described (iii) one or more material comprising alkali-reactive group is one or more comprising containing repetitivesResin material, the monomer that it is represented by below general formula (I), (II) or (III) by least one provides:

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