The producing of diffraction optical element with structured glass coating

The producing of diffraction optical element with structured glass coating

  • CN 102,707,351 A
  • Filed: 06/08/2005
  • Published: 10/03/2012
  • Est. Priority Date: 06/09/2004
  • Status: Active Application
First Claim
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1. one kind is used to apply the photolytic activity structuring to on-chip method, comprises the structuring that utilizes mask, it is characterized in that repeatedly repeating following steps:

  • Utilize photosensitive resist layer coated substrates,The layer that photolithographic structuresization applies,By means of PVD, utilize photoactive layer to apply preparatory structurized substrate, this photoactive layer comprise at least a material that is selected from the group that constitutes by glass and metal andRemove resist layer.

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