For the composition of coating on photo-resist pattern

For the composition of coating on photo-resist pattern

  • CN 102,736,418 B
  • Filed: 10/25/2005
  • Issued: 06/08/2016
  • Est. Priority Date: 10/26/2004
  • Status: Active Grant
First Claim
Patent Images

1. for applying the water-based paint compositions of photo-resist pattern, described photo-resist pattern comprise containing can with primary amine groups-NH2The photo-resist polymkeric substance of the functional group of reaction, wherein said water-based paint compositions is by containing primary amine groups-NH2And weight-average molecular weight is 10,000-80, the solvent composition that the polymkeric substance of 000, water and optional water are miscible, and wherein said composition is not containing crosslinked compound, and wherein said composition makes the thickness of photo-resist pattern improve, wherein lactone, acid anhydrides and ester can be selected from the functional group that described primary amine groups is reacted.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×