Photosensitive polymer combination, photosensitive dry film and pattern formation method

Photosensitive polymer combination, photosensitive dry film and pattern formation method

  • CN 102,741,750 B
  • Filed: 12/27/2010
  • Issued: 03/01/2017
  • Est. Priority Date: 12/28/2009
  • Status: Active Grant
First Claim
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1. a kind of photosensitive polymer combination, it comprises:

  • By monomer mixture be polymerized obtained by vinyl polymers I,Described monomer mixture comprises monomer a and vinyl monomer b containing carboxyl with phenolic hydroxyl group, the ratio of described monomer bExample is 10~

    30 moles of % in 100 moles of % of total addition of monomer;

    Vinyl monomer b containing carboxyl will be comprisedObtained by monomer mixture is polymerized, matter average molecular weight be 20,000~

    100,000 vinyl polymers II, wherein,Except described vinyl polymers I;

    Quinone di-azido compound III;

    And compound IV, described compound IV be selected underState at least one compound in the group that the compound shown in formula (5-1) and following formula (5-2) is formed,

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