Etching device and a method for etching a material of a workpiece

Etching device and a method for etching a material of a workpiece

  • CN 102,760,672 A
  • Filed: 04/27/2012
  • Published: 10/31/2012
  • Est. Priority Date: 04/28/2011
  • Status: Active Application
First Claim
Patent Images

1. Etaching device comprises:

  • Process chamber, it comprises etchant;

    Be configured to provide the structure of the laminar flow of said etchant;

    AndThe workpiece operator, it is configured to along the laminar flow of predefine track travelling workpiece through said etchant.

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