Sputtering target

Sputtering target

  • CN 102,918,004 A
  • Filed: 06/01/2011
  • Published: 02/06/2013
  • Est. Priority Date: 06/02/2010
  • Status: Active Application
First Claim
Patent Images

1. an oxide sintered body is characterized in that, contains the oxide compound of the metal X of indium (In), gallium (Ga) and positive trivalent and/or positive tetravalence, and with respect to the total amount of In and Ga, the use level of metal X is 100~

  • 10000ppm by weight.

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