Method for processing silicon gel film

Method for processing silicon gel film

  • CN 102,994,494 A
  • Filed: 11/22/2012
  • Published: 03/27/2013
  • Est. Priority Date: 11/22/2012
  • Status: Active Application
First Claim
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1. pellosil treatment process, it is characterized in that:

  • it may further comprise the steps;

    S1, pellosil is contacted with treatment solution, make treatment solution soak into pellosil fully;

    S2, will soak into completely that pellosil places 62~

    67 ℃

    of baking ovens, dry the moisture on the pellosil fully, namely get the pellosil after the processing;

    Described treatment solution is Na 2CO 3Solution or NaHCO 3Solution, and Na 2CO 3Solution or NaHCO 3The concentration of solution is 5mM~

    saturation concentration.

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