Plasma processing device and edge ring applied to the same

Plasma processing device and edge ring applied to the same

  • CN 103,165,374 A
  • Filed: 12/08/2011
  • Published: 06/19/2013
  • Est. Priority Date: 12/08/2011
  • Status: Active Grant
First Claim
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1. plasma processing apparatus, wherein, described plasma treatment appts comprises:

  • A reaction cavity, reaction cavity are around a pedestal, and the reaction cavity relative with pedestal comprises a roof, comprise in pedestal that an electrode connects radio-frequency power supply, be fixed with substrate to be processed on pedestal, space between pedestal and reaction cavity roof consists of a plasma process districtEdge ring be arranged on pedestal near and around described substrate, described edge ring upper surface is exposed to described plasma process district, wherein said edge ring comprises a body part and the cladding portion that is positioned at the body part upper surface, and described coating is titanium-containing materials.

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