Inductively coupled plasma antenna element, processing means and processing method

Inductively coupled plasma antenna element, processing means and processing method

  • CN 103,249,242 B
  • Filed: 02/07/2013
  • Issued: 12/07/2016
  • Est. Priority Date: 02/07/2012
  • Status: Active Grant
First Claim
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1. an inductively coupled plasma antenna element, has at plasmaThe sensing coupling that substrate is carried out Cement Composite Treated by Plasma is generated in the process chamber of body processing meansClosing the antenna of plasma, the feature of this inductively coupled plasma antenna element existsIn, it is configured to,Above-mentioned antenna have that formed oppositely with aforesaid substrate, generate contribute to rawBecome the plane domain of the induction field of above-mentioned inductively coupled plasma, and be configured toAbove-mentioned plane domain is made up of multiple antenna segment of generally coil antenna, the plurality ofAntenna segment is respectively provided with the planar portions of the part forming above-mentioned plane domain, above-mentioned antennaSection is to wind antenna wire rod structure on the direction intersected with aforesaid substrate longitudinal helicalBecome,It is configured to make above-mentioned plane domain shape by the above-mentioned planar portions of above-mentioned multiple antenna segmentBecoming ring-type, above-mentioned multiple antenna segment constitute the ring-type sky of antenna wire rod multistage in the form of a ringLine,The rectangular shape of aforesaid substrate, above-mentioned multistage coil antenna is in rectangular-shaped with above-mentionedThe architrave shape that substrate is corresponding, a part of antenna segment in above-mentioned multiple antenna segment is above-mentionedMultiple angles key element of plane domain, another part antenna segment in above-mentioned multiple antenna segmentMultiple limits key element for above-mentioned plane domain.

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