Apparatus and method for drying substrate

Apparatus and method for drying substrate

  • CN 103,456,664 A
  • Filed: 05/31/2013
  • Published: 12/18/2013
  • Est. Priority Date: 05/31/2012
  • Status: Active Application
First Claim
Patent Images

1. the device for dry substrate, this device comprises:

  • Housing, it is provided at and wherein carries out dry space of processing;

    Substrate support, it is arranged in described housing to support described substrate;

    Fluid is supplied with part, and it comprises the supply pipeline that is supplied to described housing for the processing fluid by supercriticality;

    AndDischarge member, it comprises the discharge pipe line for described processing fluid is given off from described housing,Wherein said supply pipeline comprises;

    The first supply pipeline, it is set to described processing fluid is supplied to described housing with the first supply flow velocity;

    AndThe second supply pipeline, it is set to described processing fluid is supplied to described housing with the second supply flow velocity.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×