Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist

Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist

  • CN 103,524,680 A
  • Filed: 06/27/2013
  • Published: 01/22/2014
  • Est. Priority Date: 06/28/2012
  • Status: Active Application
First Claim
Patent Images

1. a multipolymer, the polymerisate that it comprises following material:

  • The dissolution rate of chemical formula (I) is controlled monomer, the acyclic vinyl ether monomers of chemical formula (II) and the cyclic vinyl ether monomer of chemical formula (III);

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