Method of determining multilayer thin film deposition on a piezoelectric crystal

Method of determining multilayer thin film deposition on a piezoelectric crystal

  • CN 103,534,553 A
  • Filed: 02/03/2012
  • Published: 01/22/2014
  • Est. Priority Date: 02/03/2011
  • Status: Active Application
First Claim
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1. the method for thickness of measuring the film of the deposition on piezoelectric crystal, described method comprises the following steps:

  • A) determine the fundamental resonance frequency of piezoelectric crystal base;

    B) electrode is applied to described crystal blank;

    C) determine the fundamental resonance frequency of compound base and the electrode applying;

    D) material layer of the first deposition is applied on described crystal blank and electrode;

    E) determine the resonant frequency of the multiple resonance device of the layer that comprises described base, described electrode and described deposition;

    F) determine that each the acoustics phase place in the layer of the described crystal blank of leap, electrode and the deposition calculated at described resonant frequency place lags behind;

    AndG) according to the thickness of the layer depositing described in the density calculation of described phase place lag information and described material.

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