Method and device for forming amorphous carbon coating

Method and device for forming amorphous carbon coating

  • CN 103,572,249 A
  • Filed: 08/07/2013
  • Published: 02/12/2014
  • Est. Priority Date: 08/07/2012
  • Status: Active Application
First Claim
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1. for form a method for amorphous and hard carbon coating on the surface of substrate, said method comprising the steps of:

  • Plasma processing equipment is provided, described plasma processing equipment comprises the rod-shaped electrode around the central zone that limits the cylindrical electrode of processing cavity and be placed in described processing cavity, and the distance between wherein said rod-shaped electrode and described cylindrical electrode is 1 to 10 mm;

    Electric field is applied between the described rod-shaped electrode and described cylindrical electrode in described plasma processing equipment, to generate the plasma for the formation of coating by plasma treatment;

    WithCarry out continuously following series of steps;

    make described substrate in the situation that there is argon gas, hydrogen and nitrogen, be subject to plasma nitrided pre-treatment to form the pretreating surface of described substrate, on the described pretreating surface of described substrate, form middle layer, and make described substrate in the situation that there is carbon source, be subject to plasma CVD to process to form amorphous and hard carbon coating.

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