Projection arrangement

Projection arrangement

  • CN 103,620,500 A
  • Filed: 06/19/2012
  • Published: 03/05/2014
  • Est. Priority Date: 06/20/2011
  • Status: Active Application
First Claim
Patent Images

1. one kind for making the device for projecting (1) of photolithographic structures information imaging, comprises:

  • Optical element (2), there is at least partly the coating (14) being formed by conductive, wherein, described coating (14) comprises continuum (100), this continuum does not have the element that blocks projection light, and depend on temperature variation, described layer material and/or described optical element (2) change optical characteristics, especially refractive index or optical path length;

    AndAt least one unit (3), for Energy Coupling being entered to described layer material, makes described layer material change the energy of coupling into heat energy, and wherein, described layer material is from by Graphene, chromium and molybdenum sulfide (MoS 2) select in the group that forms.

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