Sputter target and sputtering methods

Sputter target and sputtering methods

  • CN 103,717,782 A
  • Filed: 06/14/2012
  • Published: 04/09/2014
  • Est. Priority Date: 06/30/2011
  • Status: Active Application
First Claim
Patent Images

1. a sputtering target assembly, it comprises:

  • (a) back support;

    With(b) be assembled in the two or more sputtering target subregions in described back support, target region is defined in the described assembling of two or more sputtering target subregions, and it comprises any gap or seam between described two or more sputtering target subregion;

    Wherein said two or more sputtering target subregion is constructed such that in the direction of the sputtering surface of the surface perpendicular to described back support and/or described two or more sputtering target subregions, does not arrive the sight line of described back support between any described two or more surveys.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×