Chemical vapor deposition device and cleaning method thereof

Chemical vapor deposition device and cleaning method thereof

  • CN 103,805,958 A
  • Filed: 11/14/2012
  • Published: 05/21/2014
  • Est. Priority Date: 11/14/2012
  • Status: Active Application
First Claim
Patent Images

1. a chemical vapor deposition unit, comprise:

  • reaction chamber, transmission cavity, described reaction chamber has roof, described reaction chamber bottom is provided with load bearing component, described reaction chamber is provided with well heater and actuating device, in described transmission cavity, be provided with transmitting device in order to transmit substrate pending or that be disposed or carry the plate member of substrate between described transmission cavity and described reaction chamber, described load bearing component has loading end, it is characterized in that, described chemical vapor deposition unit also comprises burnisher, described burnisher has scraping portion and fixed part, described reaction chamber has burnisher installation portion, in the time that described fixed part is arranged on burnisher installation portion, described actuating device drives described loading end to make its relatively described burnisher move to make described burnisher to clean described loading end, when after the described burnisher of upset, and when described fixed part is arranged on described loading end, described actuating device drives described loading end motion, move so that described roof is cleaned to make described burnisher contact described roof relatively described roof.

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