The apparatus and method of drying substrates

The apparatus and method of drying substrates

  • CN 103,824,757 B
  • Filed: 05/22/2008
  • Issued: 11/23/2018
  • Est. Priority Date: 05/23/2007
  • Status: Active Grant
First Claim
Patent Images

1. a kind of method of dry substrate, including:

  • Last stage sprays hot fluid to substrate bottom surface to improve the temperature of the substrate in the last stage, while to rotation baseSpray organic solvent in the upper surface of plate;

    The hot fluid is deionized water (DI water), and the organic solvent is isopropanol (IPA).

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×