Semiconductor treatment technology and semiconductor device preparation method

Semiconductor treatment technology and semiconductor device preparation method

  • CN 103,871,902 A
  • Filed: 03/24/2014
  • Published: 06/18/2014
  • Est. Priority Date: 03/24/2014
  • Status: Active Application
First Claim
Patent Images

1. a semiconductor processes, is characterized in that, comprising:

  • a substrate is provided, described substrate is carried out to the processing of minimum once oxidation-deoxidation layer, wherein, the processing of described oxidation-deoxidation layer comprises;

    Oxidation processes is carried out in the surface of described substrate, form an oxide layer on the surface of described substrate;

    Remove described oxide layer, expose described substrate.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×