Anisotropic reduction in the coating of conducting film

Anisotropic reduction in the coating of conducting film

  • CN 103,889,595 B
  • Filed: 06/27/2012
  • Issued: 06/22/2016
  • Est. Priority Date: 07/01/2011
  • Status: Active Grant
First Claim
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1. the method forming conducting film, including:

  • Thering is provided coating solution, described coating solution has multiple conducting nanowires and fluid carrier;

    Mobile mesh part in a machine direction;

    Wet film is formed by depositing described coating solution in the described mesh of movement, wherein said wet film has the first dimension and second dimension vertical with described machine direction that are parallel to the extension of described machine direction, so that at least some in described conducting nanowires is directed at along described machine direction;

    Applying air-flow on described wet film along described second dimension, thus in described wet film, the described at least some of described conducting nanowires is along described machine direction reorientation;

    AndDescribed wet film is allowed to become dry, to provide described conducting film。

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